Nghĩa của từ solution composition bằng Tiếng Việt

@Chuyên ngành kỹ thuật
@Lĩnh vực: điện lạnh
-thành phần dung dịch

Đặt câu có từ "solution composition"

Dưới đây là những mẫu câu có chứa từ "solution composition", trong bộ từ điển Từ điển Anh - Việt. Chúng ta có thể tham khảo những mẫu câu này để đặt câu trong tình huống cần đặt câu với từ solution composition, hoặc tham khảo ngữ cảnh sử dụng từ solution composition trong bộ từ điển Từ điển Anh - Việt

1. Etching-solution composition and wet etching method using same

2. Texture-etching solution composition for crystalline silicon wafers and texture-etching method

3. The possible effects of the activity coefficient variation with solution composition are discussed.

4. The present invention relates to a cleaning solution composition for a solar cell, and to a cleaning solution composition comprising an organic alkali compound, a water-soluble glycol ether compound, percarbonate, an organic phosphoric acid or a salt thereof, and water.

5. Double layer parameters were obtained by taking into account the change in activity coefficients with solution composition.

6. The study reports an analysis of the granulometric characteristics and aggregate components, pore-size distribution, microstructure, pore solution composition and cation exchangeability of the soft clay.

7. We followed the same procedures, but we manipulated the solution composition and the pH level of the solution in an effort to identify the pH concentration necessary for Coacervates to form

8. The cleaning-solution composition comprises: a water-soluble polymer including a monomolecular acid compound expressed in chemical formula 1 or a repeating unit expressed in chemical formula 3; and a solvent.

9. The present invention relates to an aqueous cleaning solution composition comprising one or more kinds of compounds selected from a boric acid derivative, an organic phosphoric acid and salts thereof, used for cleaning the surface of a substrate during a manufacturing process of a flat panel display (FPD).

10. The etching-solution composition comprises between 5 and 20 wt.% of hydrogen peroxide, between 0.1 and 5 wt.% of a sulphonic acid compound, between 0.1 and 2 wt.% of a carbonyl based organic acid compound, between 0.1 and 0.4 wt.% of a fluorine compound, between 0.01 and 3 wt.% of an azole based compound, and a remainder of water.