Nghĩa của từ electron beam deflection system bằng Tiếng Việt

@electron beam deflection system
- (Tech) hệ thống làm lệch tia tia điện tử

Đặt câu có từ "electron beam deflection system"

1. 13/ 00 Generation of oscillations using deflection of electron beam in a cathode-ray tube

2. Electron beam welding machines

3. Electronic deflection device for an ultrahigh frequency beam

4. Electron beam melted Anticathode what was an inspiration for utilisation of electron beam as a heat source

5. 11 Alternatively, electron beam machines are used.

6. An electron accelerator includes a vacuum chamber having an electron beam exit window.

7. Cathode rays (electron beam or e-beam) are streams of electrons observed in discharge tubes.

8. It uses a line electron source and so needs only one deflection component.

9. An electron beam Blanker for use in electron beam lithography systems is disclosed which is capable of providing exposure rates on the order of 300MHz at beam currents of approximately 600nA

10. Calculating Beam deflection requires knowing the stiffness of the Beam and the amount of force or load that would influence the bending of the Beam

11. Resonator structure which forms deflected electromagnetic waves for amplifying a pulse electron beam by using a secondary electron

12. These record amplitude and phase information about coherent electron beam scattering.

13. Devices and methods are provided to allow rapid deflection of a charged particle beam.

14. Process for treating flue gas with alkali injection and electron beam

15. Such a lacquer system allows negative charges to discharge, whereby the electron beam is prevented from being deflected due to charging effects.

16. The optical element (11) comprises at leas two segments (12a, 12b) for the deflection of the incident laser beam, each by a fixed deflection angle.

17. The interference pattern was so cool when the electron beam was on.

Các mô hình can thiệp đã được làm mát khi chùm tia điện tử bật lên.

18. The twt contains an electron gun which produces and then accelerates an electron beam along the axis of the tube.

19. A new achromatic isochronous deflection system is described.

20. Method for manufacturing high discharge-resistant and high stability carbon nanotube field emission electron beam emitter using metal binders and carbon nanotube field emission electron beam emitter manufactured by the method

21. A method and apparatus for controlling deflection, deceleration, and focus of an ion beam are disclosed.

22. Scanning electron microscope capable of adjusting beam spot and measuring method using same

23. A Centralized columnated beam of carrier holes is thus provided for deflection by the magnetic field.

24. Further, as an ion beam is irradiated simultaneously with the irradiation of an electron beam, the charges of the electron beam accumulated on the surface of the substrate are neutralized by the charges of the ion beam, thereby preventing electron beam charges from accumulating on the surface of the substrate, and thus preventing the formation of unnecessary surface currents, and crystallizing the amorphous silicon thin film in an efficient manner.

25. POSITION OF THE PLANE OF MAXIMUM PARTITIONING SYSTEM DEFLECTION